Hybrid Ag-mesh/Ta-doped TiO<inf>2</inf> thin film configuration as a visible and near-infrared transparent electrode

This study focuses on the fabrication of a hybrid Ag-mesh/Ta-doped TiO2 (TTO) electrode that has a low sheet resistance and high transparency in the visible and near-infrared region, thereby holding significant commercialization potential. Here, ∼82 nm thick TTO film is deposited on the glass substrate using radio frequency magnetron sputtering technique, over which Ag mesh is carved using the metal aerosol jet printing method. As compared to TTO, sheet resistance of the entire hybrid configuration is found to show a 2-3 order improvement, with the loss of a mere ∼12 % in the visible and ∼8 % in NIR transmittance. The electronic structure of the Ag/TTO interface demonstrates the formation of an ohmic junction, thereby making it suitable for the fabrication of a network-based transparent electrode. Moreover, the overall functionality and preparation route of this electrode makes it more promising as compared to those of the conventional metal mesh and metal-oxide electrodes.