Extreme ultraviolet lithographyExtreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.
Electron-beam lithographyElectron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
NanolithographyNanolithography (NL) is a growing field of techniques within nanotechnology dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of nanometer-scale structures on various materials. The modern term reflects on a design of structures built in range of 10−9 to 10−6 meters, i.e. nanometer scale. Essentially, the field is a derivative of lithography, only covering very small structures. All NL methods can be categorized into four groups: photo lithography, scanning lithography, soft lithography and other miscellaneous techniques.
PhotolithographyIn integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.
Optical coherence tomographyOptical coherence tomography (OCT) is an imaging technique that uses low-coherence light to capture micrometer-resolution, two- and three-dimensional images from within optical scattering media (e.g., biological tissue). It is used for medical imaging and industrial nondestructive testing (NDT). Optical coherence tomography is based on low-coherence interferometry, typically employing near-infrared light. The use of relatively long wavelength light allows it to penetrate into the scattering medium.
Aerial photographyAerial photography (or airborne imagery) is the taking of photographs from an aircraft or other airborne platforms. When taking motion pictures, it is also known as aerial videography. Platforms for aerial photography include fixed-wing aircraft, helicopters, unmanned aerial vehicles (UAVs or "drones"), balloons, blimps and dirigibles, rockets, pigeons, kites, or using action cameras while skydiving or wingsuiting. Handheld cameras may be manually operated by the photographer, while mounted cameras are usually remotely operated or triggered automatically.
Super-resolution microscopySuper-resolution microscopy is a series of techniques in optical microscopy that allow such images to have resolutions higher than those imposed by the diffraction limit, which is due to the diffraction of light. Super-resolution imaging techniques rely on the near-field (photon-tunneling microscopy as well as those that use the Pendry Superlens and near field scanning optical microscopy) or on the far-field.
Nanoimprint lithographyNanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
Optical microscopeThe optical microscope, also referred to as a light microscope, is a type of microscope that commonly uses visible light and a system of lenses to generate magnified images of small objects. Optical microscopes are the oldest design of microscope and were possibly invented in their present compound form in the 17th century. Basic optical microscopes can be very simple, although many complex designs aim to improve resolution and sample contrast. The object is placed on a stage and may be directly viewed through one or two eyepieces on the microscope.
Coherence (physics)In physics, coherence expresses the potential for two waves to interfere. Two monochromatic beams from a single source always interfere. Physical sources are not strictly monochromatic: they may be partly coherent. Beams from different sources are mutually incoherent. When interfering, two waves add together to create a wave of greater amplitude than either one (constructive interference) or subtract from each other to create a wave of minima which may be zero (destructive interference), depending on their relative phase.
DiffractionDiffraction is the interference or bending of waves around the corners of an obstacle or through an aperture into the region of geometrical shadow of the obstacle/aperture. The diffracting object or aperture effectively becomes a secondary source of the propagating wave. Italian scientist Francesco Maria Grimaldi coined the word diffraction and was the first to record accurate observations of the phenomenon in 1660.
Near-field scanning optical microscopeNear-field scanning optical microscopy (NSOM) or scanning near-field optical microscopy (SNOM) is a microscopy technique for nanostructure investigation that breaks the far field resolution limit by exploiting the properties of evanescent waves. In SNOM, the excitation laser light is focused through an aperture with a diameter smaller than the excitation wavelength, resulting in an evanescent field (or near-field) on the far side of the aperture.
Aerial reconnaissanceAerial reconnaissance is reconnaissance for a military or strategic purpose that is conducted using reconnaissance aircraft. The role of reconnaissance can fulfil a variety of requirements including artillery spotting, the collection of , and the observation of enemy maneuvers. Aerial photography#History and Imagery intelligence#History Espionage balloon After the French Revolution, the new rulers became interested in using the balloon to observe enemy manoeuvres and appointed scientist Charles Coutelle to conduct studies using the balloon L'Entreprenant, the first military reconnaissance aircraft.
Coherence lengthIn physics, coherence length is the propagation distance over which a coherent wave (e.g. an electromagnetic wave) maintains a specified degree of coherence. Wave interference is strong when the paths taken by all of the interfering waves differ by less than the coherence length. A wave with a longer coherence length is closer to a perfect sinusoidal wave. Coherence length is important in holography and telecommunications engineering. This article focuses on the coherence of classical electromagnetic fields.
Exposure (photography)In photography, exposure is the amount of light per unit area (the 's illuminance times the exposure time) reaching a frame of photographic film or the surface of an electronic , as determined by shutter speed, lens F-number, and scene luminance. Exposure is measured in lux seconds, and can be computed from exposure value (EV) and scene luminance in a specified region. An "exposure" is a single shutter cycle.
MicroscopyMicroscopy is the technical field of using microscopes to view objects and areas of objects that cannot be seen with the naked eye (objects that are not within the resolution range of the normal eye). There are three well-known branches of microscopy: optical, electron, and scanning probe microscopy, along with the emerging field of X-ray microscopy. Optical microscopy and electron microscopy involve the diffraction, reflection, or refraction of electromagnetic radiation/electron beams interacting with the specimen, and the collection of the scattered radiation or another signal in order to create an image.
Aerial surveyAerial survey is a method of collecting geomatics or other ry by using airplanes, helicopters, UAVs, balloons or other aerial methods. Typical types of data collected include aerial photography, Lidar, remote sensing (using various visible and invisible bands of the electromagnetic spectrum, such as infrared, gamma, or ultraviolet) and also geophysical data (such as aeromagnetic surveys and gravity. It can also refer to the chart or map made by analysing a region from the air.
Wave interferenceIn physics, interference is a phenomenon in which two coherent waves are combined by adding their intensities or displacements with due consideration for their phase difference. The resultant wave may have greater intensity (constructive interference) or lower amplitude (destructive interference) if the two waves are in phase or out of phase, respectively. Interference effects can be observed with all types of waves, for example, light, radio, acoustic, surface water waves, gravity waves, or matter waves as well as in loudspeakers as electrical waves.
Light meterA light meter is a device used to measure the amount of light. In photography, a light meter (more correctly an exposure meter) is used to determine the proper exposure for a photograph. The meter will include either a digital or analog calculator which displays the correct shutter speed and f-number for optimum exposure, given a certain lighting situation and film speed. Similarly, exposure meters are also used in the fields of cinematography and scenic design, in order to determine the optimum light level for a scene.
LithographyLithography () is a planographic method of printing originally based on the immiscibility of oil and water. The printing is from a stone (lithographic limestone) or a metal plate with a smooth surface. It was invented in 1796 by the German author and actor Alois Senefelder and was initially used mostly for musical scores and maps. Lithography can be used to print text or images onto paper or other suitable material.
