Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.
DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.
We explore the formation of Schottky barriers by adsorption of Ge overlayers onto single crystal Ni and Ag substrates. The results are compared to earlier results from Si-on-metal systems as well as interfaces formed by the metal-on-semiconductor deposition sequence. We find that Ge overlayers on Ag form extended interfaces with the creation of an intermediate metallic phase - whereas Ag on Ge forms abrupt interfaces. However, the Ge on Ni interface is found to be abrupt. For the resultant p-type Schottky barrier heights we report values of 0.18 eV for Ge/Ag(111) and Ge/Ag(100) - in agreement with the Ag-on-Ge value - and of 0.17 eV for Ge/Ni(111). The pinning strength parameter derived from our data is S = 0.11 eV, in agreement with the value for metal-on-Ge interfaces.