Publication

Coherent microradiology directly observes a critical cathode-anode distance effect in localized electrochemical deposition

Giorgio Margaritondo
2004
Journal Articles

Abstract

Localized electrochemical deposition (LECD) is an emerging technology for inexpensive and effective fabrication of high-aspect-ratio microstructure of diverse materials. Microradiology with coherent X-rays enabled study of this process in real-time. This led to the discovery of a fundamental role of the microelectrode-structure distance: for short distances the deposition rate increases dramatically but the product becomes porous. This role is explained qualitatively with the interplay between metal-ion diffusion and migration in the deposition process. (C) 2004 The Electrochemical Society.

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https://infoscience.epfl.ch/entities/publication/0452667f-d3a1-4e2d-8a43-126d99427d4c

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Giorgio Margaritondo
2004
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/0452667f-d3a1-4e2d-8a43-126d99427d4c

About this result

Related concepts (32)

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

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Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

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Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

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Coherent microradiology directly observes a critical cathode-anode distance effect in localized electrochemical deposition

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