Publication

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Nava Setter, Paul Muralt, Jacek Baborowski, Nicolas Xanthopoulos, Nicolas Ledermann
2003
Journal Articles

Abstract

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is employed to characterize the surface of patterned noble metal (Pt) and titania (TiO2) thin films deposited on oxidized silicon wafers. ToF-SIMS is used to follow the different process steps during the thin films patterning as well as the post-processing cleaning. Both positive and negative ToF-SIMS modes reveal the presence of contaminants, due to the etching processes (Cl- Al-,(+)), but only on the etched surfaces. Elements due to the post-processing cleaning (K+, Na+, Pb+) and photoresist residues are also detected but on the entire wafer surface. The utility of these chemically well-defined titania/platinum patterns is demonstrated for the,selective adsorption of phosphonic acid derivatives. Typical fragments of phosphonic acid groups, i.e. PO2- and PO3- show their preferential adsorption on TiO2. (C) 2002 Elsevier Science B.V. All rights reserved.

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https://infoscience.epfl.ch/entities/publication/03fcda9c-52a7-478c-8b55-1be8c5ddd9e4

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Nava Setter, Paul Muralt, Jacek Baborowski, Nicolas Xanthopoulos, Nicolas Ledermann
2003
Journal Articles

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/03fcda9c-52a7-478c-8b55-1be8c5ddd9e4

About this result

Related concepts (32)

Secondary ion mass spectrometry

Secondary-ion mass spectrometry (SIMS) is a technique used to analyze the composition of solid surfaces and thin films by sputtering the surface of the specimen with a focused primary ion beam and collecting and analyzing ejected secondary ions. The mass/charge ratios of these secondary ions are measured with a mass spectrometer to determine the elemental, isotopic, or molecular composition of the surface to a depth of 1 to 2 nm.

Thin film

A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.

Electron ionization

Electron ionization (EI, formerly known as electron impact ionization and electron bombardment ionization) is an ionization method in which energetic electrons interact with solid or gas phase atoms or molecules to produce ions. EI was one of the first ionization techniques developed for mass spectrometry. However, this method is still a popular ionization technique. This technique is considered a hard (high fragmentation) ionization method, since it uses highly energetic electrons to produce ions.

Related publications (32)

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

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DATASET for Long-term protection of crystalline zinc phosphide (Zn3P2) under atmospheric conditions