Publication

METHOD OF PRODUCING A METAL MICRO-/NANOELECTRODE AND MICRO-/NANOELECTRODE WITH SINGLE-CRYSTALLINE METAL DEPOSIT

2026

Abstract

[0001] There is described method of producing a metal micro-/nanoelectrode (EL), the method comprising: (a) providing a glass pipette template (PT), the glass pipette template (PT) exhibiting a tapered portion (TP) terminating with a tip of micrometric or nanometric scale, the tapered portion (TP) being adapted to contain a solution; (b) filling at least part of the tapered portion (TP) of the glass pipette template (PT) with a chemical growth solution (GS) containing a metal precursor suitable for selective growth of a metal deposit (MD) inside the tapered portion (TP); (c) processing the taper-filled glass pipette templates (PT) in bulk media (BM) containing a reacting agent to drive nucleation and growth of a metal deposit (MD) from the chemical growth solution (GS) in the tapered portion (TP) of the glass pipette template (PT); and (d) physically connecting a micro-wire (MW) to the metal deposit (MD) formed inside the tapered portion (TP) of the glass pipette template (PT). [0002] The method especially allows the formation of thin-wall micro-/nanoelectrodes (EL) with single-crystalline metal deposits (MD), which forms another aspect of the invention.

Official source

https://infoscience.epfl.ch/entities/publication/03662437-c79a-400f-a4fe-2f23dd8117fe

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2026

Abstract

Official source

https://infoscience.epfl.ch/entities/publication/03662437-c79a-400f-a4fe-2f23dd8117fe

About this result

Related concepts (31)

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Single crystal

In materials science, a single crystal (or single-crystal solid or monocrystalline solid) is a material in which the crystal lattice of the entire sample is continuous and unbroken to the edges of the sample, with no grain boundaries. The absence of the defects associated with grain boundaries can give monocrystals unique properties, particularly mechanical, optical and electrical, which can also be anisotropic, depending on the type of crystallographic structure.

Crystalline silicon

Crystalline silicon or (c-Si) Is the crystalline forms of silicon, either polycrystalline silicon (poly-Si, consisting of small crystals), or monocrystalline silicon (mono-Si, a continuous crystal). Crystalline silicon is the dominant semiconducting material used in photovoltaic technology for the production of solar cells. These cells are assembled into solar panels as part of a photovoltaic system to generate solar power from sunlight. In electronics, crystalline silicon is typically the monocrystalline form of silicon, and is used for producing microchips.

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METHOD OF PRODUCING A METAL MICRO-/NANOELECTRODE AND MICRO-/NANOELECTRODE WITH SINGLE-CRYSTALLINE METAL DEPOSIT

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