Oscar Vazquez Mena

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Related publications (44)

Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Jürgen Brugger, Oscar Vazquez Mena

We propose a new process for forming parallel nanobridge patterns by nanostencil lithography. In this process, a low-stress silicon nitride stencil with parallel nanobridge structures is fabricated by a new edge patterning technique where those nanobridges ...

2007

Integrated Nickel Micro-Nano-Hall Sensors on SU-8 Cantilevers for Scanning Hall Probe Microscopy

Radivoje Popovic, Giovanni Boero, Christian Santschi, Chantal Imboden, Jürgen Brugger, Schahrazede-Lila Mouaziz, Oscar Vazquez Mena

We report the fabrication and characterization of nickel Hall sensors integrated on SU-8 cantilevers. Sensors having active area down to 1x1 μm 2 show a magnetic field resolution better than 1μT/Hz 1/2 in the thermal noise frequency range. The fabricated d ...

IEEE2007

Towards Reliable 100-Nanometer Scale Stencil Lithography on Full Wafer: Progress AND Challenges

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We have fabricated new and robust nanostencil membranes for the surface patterning of 100-nm scale Al wires on full wafer scale. The stencil membranes are mechanically reinforced with corrugations, making them more stable against accumulated stress. The ap ...

IEEE2007

Reverse transfer of nanostencil patterns using intermediate sacrificial layer and lift-off process

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena

We propose a new process by which patterns produced by nanostencil lithography can be reversed, so that the final pattern on the substrate has the same contrast (filled or empty) as that of the stencil. In this process, the stencil pattern is first formed ...

2006

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