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Michaël Chesaux

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Related publications (4)

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Low ion energy RF reactor using an array of plasmas through a grounded grid

Christoph Hollenstein, Alan Howling, Michaël Chesaux

A reactor using localized remote plasma in a grid electrode is presented in this study. The aim is to reduce the ion bombardment energy inherent in RF capacitively coupled parallel plate reactors used to deposit large area thin film silicon solar cells. Hi ...

A V S Amer Inst Physics2013

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

Christoph Hollenstein, Alan Howling, Boris Legradic, Michaël Chesaux

The interplay of gas flow and depletion by plasma dissociation determines the spatial distribution of species and the deposition uniformity in a plasma source. Many plasma reactors use a gas showerhead and the design of the flow dynamics is a critical aspe ...

2012

Funnelling of rf current via a plasmoid through a grid hole in an rf capacitive plasma reactor

Christoph Hollenstein, Alan Howling, Michaël Chesaux

The boundaries of capacitively coupled radio-frequency (rf) plasma reactors generally include at least one grounded metal grid or perforated plate for purposes of gas flow or diagnostic access. When increasing the rf power, an intense localized plasma (a p ...

Iop Publishing Ltd2013

A Grid Reactor with Low Ion Bombardment Energy for Large Area PECVD of Thin Film Silicon Solar Cells

Michaël Chesaux

EPFL2013