Gaussian beamIn optics, a Gaussian beam is a beam of electromagnetic radiation with high monochromaticity whose amplitude envelope in the transverse plane is given by a Gaussian function; this also implies a Gaussian intensity (irradiance) profile. This fundamental (or TEM00) transverse Gaussian mode describes the intended output of most (but not all) lasers, as such a beam can be focused into the most concentrated spot. When such a beam is refocused by a lens, the transverse phase dependence is altered; this results in a different Gaussian beam.
LaserA laser is a device that emits light through a process of optical amplification based on the stimulated emission of electromagnetic radiation. The word laser is an anacronym that originated as an acronym for light amplification by stimulated emission of radiation. The first laser was built in 1960 by Theodore Maiman at Hughes Research Laboratories, based on theoretical work by Charles H. Townes and Arthur Leonard Schawlow. A laser differs from other sources of light in that it emits light that is coherent.
Fiber laserA fiber laser (or fibre laser in Commonwealth English) is a laser in which the active gain medium is an optical fiber doped with rare-earth elements such as erbium, ytterbium, neodymium, dysprosium, praseodymium, thulium and holmium. They are related to doped fiber amplifiers, which provide light amplification without lasing. Fiber nonlinearities, such as stimulated Raman scattering or four-wave mixing can also provide gain and thus serve as gain media for a fiber laser.
Laser cuttingLaser cutting is a technology that uses a laser to vaporize materials, resulting in a cut edge. While typically used for industrial manufacturing applications, it is now used by schools, small businesses, architecture, and hobbyists. Laser cutting works by directing the output of a high-power laser most commonly through optics. The laser optics and CNC (computer numerical control) are used to direct the laser beam to the material. A commercial laser for cutting materials uses a motion control system to follow a CNC or G-code of the pattern to be cut onto the material.
TelescopeA telescope is a device used to observe distant objects by their emission, absorption, or reflection of electromagnetic radiation. Originally it was an optical instrument using lenses, curved mirrors, or a combination of both to observe distant objects – an optical telescope. Nowadays, the word "telescope" is defined as wide range of instruments capable of detecting different regions of the electromagnetic spectrum, and in some cases other types of detectors.
Beam divergenceIn electromagnetics, especially in optics, beam divergence is an angular measure of the increase in beam diameter or radius with distance from the optical aperture or antenna aperture from which the beam emerges. The term is relevant only in the "far field", away from any focus of the beam. Practically speaking, however, the far field can commence physically close to the radiating aperture, depending on aperture diameter and the operating wavelength.
Reflecting telescopeA reflecting telescope (also called a reflector) is a telescope that uses a single or a combination of curved mirrors that reflect light and form an . The reflecting telescope was invented in the 17th century by Isaac Newton as an alternative to the refracting telescope which, at that time, was a design that suffered from severe chromatic aberration. Although reflecting telescopes produce other types of optical aberrations, it is a design that allows for very large diameter objectives.
Optical telescopeAn optical telescope is a telescope that gathers and focuses light mainly from the visible part of the electromagnetic spectrum, to create a magnified image for direct visual inspection, to make a photograph, or to collect data through electronic s. There are three primary types of optical telescope: Refracting telescopes, which use lenses and less commonly also prisms (dioptrics) Reflecting telescopes, which use mirrors (catoptrics) Catadioptric telescopes, which combine lenses and mirrors An optical telescope's ability to resolve small details is directly related to the diameter (or aperture) of its objective (the primary lens or mirror that collects and focuses the light), and its light-gathering power is related to the area of the objective.
Dye laserA dye laser is a laser that uses an organic dye as the lasing medium, usually as a liquid solution. Compared to gases and most solid state lasing media, a dye can usually be used for a much wider range of wavelengths, often spanning 50 to 100 nanometers or more. The wide bandwidth makes them particularly suitable for tunable lasers and pulsed lasers. The dye rhodamine 6G, for example, can be tuned from 635 nm (orangish-red) to 560 nm (greenish-yellow), and produce pulses as short as 16 femtoseconds.
Laser diodeA laser diode (LD, also injection laser diode or ILD, or diode laser) is a semiconductor device similar to a light-emitting diode in which a diode pumped directly with electrical current can create lasing conditions at the diode's junction. Driven by voltage, the doped p–n-transition allows for recombination of an electron with a hole. Due to the drop of the electron from a higher energy level to a lower one, radiation, in the form of an emitted photon is generated. This is spontaneous emission.
Hale TelescopeThe Hale Telescope is a , 3.3 reflecting telescope at the Palomar Observatory in San Diego County, California, US, named after astronomer George Ellery Hale. With funding from the Rockefeller Foundation in 1928, he orchestrated the planning, design, and construction of the observatory, but with the project ending up taking 20 years he did not live to see its commissioning. The Hale was groundbreaking for its time, with double the diameter of the second-largest telescope, and pioneered many new technologies in telescope mount design and in the design and fabrication of its large aluminum coated "honeycomb" low thermal expansion Pyrex mirror.
PhotolithographyIn integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.
Refracting telescopeA refracting telescope (also called a refractor) is a type of optical telescope that uses a lens as its objective to form an image (also referred to a dioptric telescope). The refracting telescope design was originally used in spyglasses and astronomical telescopes but is also used for long-focus camera lenses. Although large refracting telescopes were very popular in the second half of the 19th century, for most research purposes, the refracting telescope has been superseded by the reflecting telescope, which allows larger apertures.
Rayleigh lengthIn optics and especially laser science, the Rayleigh length or Rayleigh range, , is the distance along the propagation direction of a beam from the waist to the place where the area of the cross section is doubled. A related parameter is the confocal parameter, b, which is twice the Rayleigh length. The Rayleigh length is particularly important when beams are modeled as Gaussian beams.
Amateur telescope makingAmateur telescope making is the activity of building telescopes as a hobby, as opposed to being a paid professional. Amateur telescope makers (sometimes called ATMs) build their instruments for personal enjoyment of a technical challenge, as a way to obtain an inexpensive or personally customized telescope, or as a research tool in the field of astronomy. Amateur telescope makers are usually a sub-group in the field of amateur astronomy. Ever since Galileo Galilei adapted a Dutch invention for astronomical use, astronomical telescope making has been an evolving discipline.
Laser drillingLaser drilling is the process of creating thru-holes, referred to as “popped” holes or “percussion drilled” holes, by repeatedly pulsing focused laser energy on a material. The diameter of these holes can be as small as 0.002” (~50 μm). If larger holes are required, the laser is moved around the circumference of the “popped” hole until the desired diameter is created. Laser drilling is one of the few techniques for producing high-aspect-ratio holes—holes with a depth-to-diameter ratio much greater than 10:1.
Laser engravingLaser engraving is the practice of using lasers to engrave an object. Laser marking, on the other hand, is a broader category of methods to leave marks on an object, which in some cases, also includes color change due to chemical/molecular alteration, charring, foaming, melting, ablation, and more. The technique does not involve the use of inks, nor does it involve tool bits which contact the engraving surface and wear out, giving it an advantage over alternative engraving or marking technologies where inks or bit heads have to be replaced regularly.
Interference lithographyInterference lithography (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima.
Electron-beam lithographyElectron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
Extreme ultraviolet lithographyExtreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.
