Plasma (physics)Plasma () is one of four fundamental states of matter, characterized by the presence of a significant portion of charged particles in any combination of ions or electrons. It is the most abundant form of ordinary matter in the universe, being mostly associated with stars, including the Sun. Extending to the rarefied intracluster medium and possibly to intergalactic regions, plasma can be artificially generated by heating a neutral gas or subjecting it to a strong electromagnetic field.
Plasma etchingPlasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma.
Etching (microfabrication)Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.
MicrofabricationMicrofabrication is the process of fabricating miniature structures of micrometre scales and smaller. Historically, the earliest microfabrication processes were used for integrated circuit fabrication, also known as "semiconductor manufacturing" or "semiconductor device fabrication". In the last two decades microelectromechanical systems (MEMS), microsystems (European usage), micromachines (Japanese terminology) and their subfields, microfluidics/lab-on-a-chip, optical MEMS (also called MOEMS), RF MEMS, PowerMEMS, BioMEMS and their extension into nanoscale (for example NEMS, for nano electro mechanical systems) have re-used, adapted or extended microfabrication methods.
Radio frequencyRadio frequency (RF) is the oscillation rate of an alternating electric current or voltage or of a magnetic, electric or electromagnetic field or mechanical system in the frequency range from around 20kHz to around 300GHz. This is roughly between the upper limit of audio frequencies and the lower limit of infrared frequencies. These are the frequencies at which energy from an oscillating current can radiate off a conductor into space as radio waves, so they are used in radio technology, among other uses.
Radio-frequency engineeringRadio-frequency (RF) engineering is a subset of electronic engineering involving the application of transmission line, waveguide, antenna and electromagnetic field principles to the design and application of devices that produce or use signals within the radio band, the frequency range of about 20 kHz up to 300 GHz. It is incorporated into almost everything that transmits or receives a radio wave, which includes, but is not limited to, mobile phones, radios, WiFi, and two-way radios.
Reactive-ion etchingReactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber.
Radio spectrumThe radio spectrum is the part of the electromagnetic spectrum with frequencies from 3 Hz to 3,000 GHz (3 THz). Electromagnetic waves in this frequency range, called radio waves, are widely used in modern technology, particularly in telecommunication. To prevent interference between different users, the generation and transmission of radio waves is strictly regulated by national laws, coordinated by an international body, the International Telecommunication Union (ITU).
High frequencyHigh frequency (HF) is the ITU designation for the range of radio frequency electromagnetic waves (radio waves) between 3 and 30 megahertz (MHz). It is also known as the decameter band or decameter wave as its wavelengths range from one to ten decameters (ten to one hundred meters). Frequencies immediately below HF are denoted medium frequency (MF), while the next band of higher frequencies is known as the very high frequency (VHF) band. The HF band is a major part of the shortwave band of frequencies, so communication at these frequencies is often called shortwave radio.
IonizationIonization (or ionisation) is the process by which an atom or a molecule acquires a negative or positive charge by gaining or losing electrons, often in conjunction with other chemical changes. The resulting electrically charged atom or molecule is called an ion. Ionization can result from the loss of an electron after collisions with subatomic particles, collisions with other atoms, molecules and ions, or through the interaction with electromagnetic radiation.
Double layer (plasma physics)A double layer is a structure in a plasma consisting of two parallel layers of opposite electrical charge. The sheets of charge, which are not necessarily planar, produce localised excursions of electric potential, resulting in a relatively strong electric field between the layers and weaker but more extensive compensating fields outside, which restore the global potential. Ions and electrons within the double layer are accelerated, decelerated, or deflected by the electric field, depending on their direction of motion.
Degree of ionizationThe degree of ionization (also known as ionization yield in the literature) refers to the proportion of neutral particles, such as those in a gas or aqueous solution, that are ionized. For electrolytes, it could be understood as a capacity of acid/base to ionize itself. A low degree of ionization is sometimes called partially ionized (also weakly ionized), and a high degree of ionization as fully ionized. However, fully ionized can also mean that an ion has no electrons left.
Chemical ionizationChemical ionization (CI) is a soft ionization technique used in mass spectrometry. This was first introduced by Burnaby Munson and Frank H. Field in 1966. This technique is a branch of gaseous ion-molecule chemistry. Reagent gas molecules (often methane or ammonia) are ionized by electron ionization to form reagent ions, which subsequently react with analyte molecules in the gas phase to create analyte ions for analysis by mass spectrometry.
Plasma globeA plasma ball, plasma globe or plasma lamp is a clear glass container filled with a mixture of various noble gases with a high-voltage electrode in the center of the container. When voltage is applied, a plasma is formed within the container. Plasma filaments extend from the inner electrode to the outer glass insulator, giving the appearance of multiple constant beams of colored light (see corona discharge and electric glow discharge). Plasma balls were popular as novelty items in the 1980s.
ElectrodeAn electrode is an electrical conductor used to make contact with a nonmetallic part of a circuit (e.g. a semiconductor, an electrolyte, a vacuum or air). Electrodes are essential parts of batteries that can consist of a variety of materials depending on the type of battery. The electrophore, invented by Johan Wilcke, was an early version of an electrode used to study static electricity. Electrodes are an essential part of any battery. The first electrochemical battery made was devised by Alessandro Volta and was aptly named the Voltaic cell.
Plasma stabilityThe stability of a plasma is an important consideration in the study of plasma physics. When a system containing a plasma is at equilibrium, it is possible for certain parts of the plasma to be disturbed by small perturbative forces acting on it. The stability of the system determines if the perturbations will grow, oscillate, or be damped out. In many cases, a plasma can be treated as a fluid and its stability analyzed with magnetohydrodynamics (MHD).
Ion thrusterAn ion thruster, ion drive, or ion engine is a form of electric propulsion used for spacecraft propulsion. It creates thrust by accelerating ions using electricity. An ion thruster ionizes a neutral gas by extracting some electrons out of atoms, creating a cloud of positive ions. Ion thrusters are categorized as either electrostatic or electromagnetic. Electrostatic thruster ions are accelerated by the Coulomb force along the electric field direction.
Gridded ion thrusterThe gridded ion thruster is a common design for ion thrusters, a highly efficient low-thrust spacecraft propulsion method running on electrical power by using high-voltage grid electrodes to accelerate ions with electrostatic forces. The ion engine was first demonstrated by German-born NASA scientist Ernst Stuhlinger, and developed in practical form by Harold R. Kaufman at NASA Lewis (now Glenn) Research Center from 1957 to the early 1960s. The use of ion propulsion systems were first demonstrated in space by the NASA Lewis "Space Electric Rocket Test" (SERT) I and II.
Ion sourceAn ion source is a device that creates atomic and molecular ions. Ion sources are used to form ions for mass spectrometers, optical emission spectrometers, particle accelerators, ion implanters and ion engines. Electron ionization Electron ionization is widely used in mass spectrometry, particularly for organic molecules. The gas phase reaction producing electron ionization is M{} + e^- -> M^{+\bullet}{} + 2e^- where M is the atom or molecule being ionized, e^- is the electron, and M^{+\bullet} is the resulting ion.
Standard hydrogen electrodeIn electrochemistry, the standard hydrogen electrode (abbreviated SHE), is a redox electrode which forms the basis of the thermodynamic scale of oxidation-reduction potentials. Its absolute electrode potential is estimated to be 4.44 ± 0.02 V at 25 °C, but to form a basis for comparison with all other electrochemical reactions, hydrogen's standard electrode potential (E°) is declared to be zero volts at any temperature. Potentials of all other electrodes are compared with that of the standard hydrogen electrode at the same temperature.
