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Lecture

Fabrication Technology

In course

EE-330: Digital IC design

Digital IC Design presents the fundamentals of digital integrated circuit design. The methods and techniques aiming at the fabrication and development of digital integrated circuits are reviewed, the major design style pertaining to digital logic and memor ...

Description

This lecture covers the process integration in semiconductor fabrication, including the twin-well process, isolation methods like LOCOS and STI, threshold voltage adjustment, poly gate formation, LDD extension implant, source/drain formation, and back-end-of-line processes. It also discusses the formation of silicide, types of silicides, and their importance in modern deep-submicron processes like the damascene and dual-damascene copper processes.

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Instructor

Alexandre Schmid

Alexandre Schmid received the M.Sc. degree in microengineering and the Ph.D. degree in electrical engineering from the Swiss Federal Institute of Technology (EPFL), Lausanne, Switzerland, in 1994 and 2000, respectively. Since 1994, he has been with the EPFL, working with the Integrated Systems Laboratory as a Research and Teaching Assistant, and with the Electronics Laboratories as a Postdoctoral Fellow. In 2002, he was a Senior Research Associate with the Microelectronic Systems Laboratory, where he has been conducting research in the fields of bioelectronic interfaces and implantable biomedical electronics, nonconventional signal processing and neuromorphic hardware, and reliability of nanoelectronic devices, and also teaches with the Microengineering and Electrical Engineering Departments of EPFL. Since 2011, he is a Maître d'Enseignement et de Recherche (MER) Faculty Member with EPFL. He is a coauthor of two books, Reliability of Nanoscale Circuits and Systems, Methodologies and Circuit Architectures, Springer, 2011, and Wireless Cortical Implantable Systems, Springer, 2013, and a coeditor of one book, as well as over 100 articles published in journals and conferences. Dr. Schmid has served as the General Chair of the Fourth International Conference on Nano-Networks in 2009 and has been serving as an Associate Editor of the Institute of Electrical, Information, and Communication Engineers Electronics Express since 2009.

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Related concepts (32)

MOSFET

The metal-oxide-semiconductor field-effect transistor (MOSFET, MOS-FET, or MOS FET) is a type of field-effect transistor (FET), most commonly fabricated by the controlled oxidation of silicon. It has an insulated gate, the voltage of which determines the conductivity of the device. This ability to change conductivity with the amount of applied voltage can be used for amplifying or switching electronic signals. A metal-insulator-semiconductor field-effect transistor (MISFET) is a term almost synonymous with MOSFET.

Field-effect transistor

The field-effect transistor (FET) is a type of transistor that uses an electric field to control the flow of current in a semiconductor. FETs (JFETs or MOSFETs) are devices with three terminals: source, gate, and drain. FETs control the flow of current by the application of a voltage to the gate, which in turn alters the conductivity between the drain and source. FETs are also known as unipolar transistors since they involve single-carrier-type operation.

Semiconductor device fabrication

Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM) that are present in everyday electrical and electronic devices. It is a multiple-step photolithographic and physio-chemical process (with steps such as thermal oxidation, thin-film deposition, ion-implantation, etching) during which electronic circuits are gradually created on a wafer, typically made of pure single-crystal semiconducting material.

Semiconductor fabrication plant

In the microelectronics industry, a semiconductor fabrication plant (commonly called a fab; sometimes foundry) is a factory for semiconductor device fabrication. Fabs require many expensive devices to function. Estimates put the cost of building a new fab over one billion U.S. dollars with values as high as

3–4 billion not being uncommon. TSMC invested

9.3 billion in its Fab15 300 mm wafer manufacturing facility in Taiwan. The same company estimations suggest that their future fab might cost $20 billion.

Semiconductor industry

The semiconductor industry is the aggregate of companies engaged in the design and fabrication of semiconductors and semiconductor devices, such as transistors and integrated circuits. It formed around 1960, once the fabrication of semiconductor devices became a viable business. The industry's annual semiconductor sales revenue has since grown to over , as of 2018.

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