PhotoresistA photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.
Electron-beam lithographyElectron-beam lithography (often abbreviated as e-beam lithography, EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
MicrofabricationMicrofabrication is the process of fabricating miniature structures of micrometre scales and smaller. Historically, the earliest microfabrication processes were used for integrated circuit fabrication, also known as "semiconductor manufacturing" or "semiconductor device fabrication". In the last two decades microelectromechanical systems (MEMS), microsystems (European usage), micromachines (Japanese terminology) and their subfields, microfluidics/lab-on-a-chip, optical MEMS (also called MOEMS), RF MEMS, PowerMEMS, BioMEMS and their extension into nanoscale (for example NEMS, for nano electro mechanical systems) have re-used, adapted or extended microfabrication methods.
Etching (microfabrication)Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.
Absorbed doseAbsorbed dose is a dose quantity which is the measure of the energy deposited in matter by ionizing radiation per unit mass. Absorbed dose is used in the calculation of dose uptake in living tissue in both radiation protection (reduction of harmful effects), and radiology (potential beneficial effects, for example in cancer treatment). It is also used to directly compare the effect of radiation on inanimate matter such as in radiation hardening. The SI unit of measure is the gray (Gy), which is defined as one Joule of energy absorbed per kilogram of matter.
Extreme ultraviolet lithographyExtreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in semiconductor device fabrication to make integrated circuits (ICs). It uses extreme ultraviolet (EUV) wavelengths near 13.5 nm, using a laser-pulsed tin (Sn) droplet plasma (Sn ions in the ionic states from Sn IX to Sn XIV give photon emission spectral peaks around 13.5 nm from 4p64dn - 4p54dn+1 + 4dn-14f ionic state transitions.), to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist.
CT scanA computed tomography scan (usually abbreviated to CT scan; formerly called computed axial tomography scan or CAT scan) is a medical imaging technique used to obtain detailed internal images of the body. The personnel that perform CT scans are called radiographers or radiology technologists. CT scanners use a rotating X-ray tube and a row of detectors placed in a gantry to measure X-ray attenuations by different tissues inside the body.
MicrolithographyMicrolithography is a general name for any manufacturing process that can create a minutely patterned thin film of protective materials over a substrate, such as a silicon wafer, in order to protect selected areas of it during subsequent etching, deposition, or implantation operations. The term is normally used for processes that can reliably produce features of microscopic size, such as 10 micrometres or less. The term nanolithography may be used to designate processes that can produce nanoscale features, such as less than 100 nanometres.
Gaussian beamIn optics, a Gaussian beam is a beam of electromagnetic radiation with high monochromaticity whose amplitude envelope in the transverse plane is given by a Gaussian function; this also implies a Gaussian intensity (irradiance) profile. This fundamental (or TEM00) transverse Gaussian mode describes the intended output of most (but not all) lasers, as such a beam can be focused into the most concentrated spot. When such a beam is refocused by a lens, the transverse phase dependence is altered; this results in a different Gaussian beam.
Beam divergenceIn electromagnetics, especially in optics, beam divergence is an angular measure of the increase in beam diameter or radius with distance from the optical aperture or antenna aperture from which the beam emerges. The term is relevant only in the "far field", away from any focus of the beam. Practically speaking, however, the far field can commence physically close to the radiating aperture, depending on aperture diameter and the operating wavelength.
Nuclear falloutNuclear fallout is the residual radioactive material propelled into the upper atmosphere following a nuclear blast, so called because it "falls out" of the sky after the explosion and the shock wave has passed. It commonly refers to the radioactive dust and ash created when a nuclear weapon explodes. The amount and spread of fallout is a product of the size of the weapon and the altitude at which it is detonated.
SievertThe sievert (symbol: Sv) is a unit in the International System of Units (SI) intended to represent the stochastic health risk of ionizing radiation, which is defined as the probability of causing radiation-induced cancer and genetic damage. The sievert is important in dosimetry and radiation protection. It is named after Rolf Maximilian Sievert, a Swedish medical physicist renowned for work on radiation dose measurement and research into the biological effects of radiation.
Gaussian integralThe Gaussian integral, also known as the Euler–Poisson integral, is the integral of the Gaussian function over the entire real line. Named after the German mathematician Carl Friedrich Gauss, the integral is Abraham de Moivre originally discovered this type of integral in 1733, while Gauss published the precise integral in 1809. The integral has a wide range of applications. For example, with a slight change of variables it is used to compute the normalizing constant of the normal distribution.
Error functionIn mathematics, the error function (also called the Gauss error function), often denoted by erf, is a complex function of a complex variable defined as: Some authors define without the factor of . This nonelementary integral is a sigmoid function that occurs often in probability, statistics, and partial differential equations. In many of these applications, the function argument is a real number. If the function argument is real, then the function value is also real.
Printed circuit boardA printed circuit board (PCB), also called printed wiring board (PWB), is a medium used to connect or "wire" components to one another in a circuit. It takes the form of a laminated sandwich structure of conductive and insulating layers: each of the conductive layers is designed with an artwork pattern of traces, planes and other features (similar to wires on a flat surface) etched from one or more sheet layers of copper laminated onto and/or between sheet layers of a non-conductive substrate.
Gaussian functionIn mathematics, a Gaussian function, often simply referred to as a Gaussian, is a function of the base form and with parametric extension for arbitrary real constants a, b and non-zero c. It is named after the mathematician Carl Friedrich Gauss. The graph of a Gaussian is a characteristic symmetric "bell curve" shape. The parameter a is the height of the curve's peak, b is the position of the center of the peak, and c (the standard deviation, sometimes called the Gaussian RMS width) controls the width of the "bell".
Ionization chamberThe ionization chamber is the simplest type of gaseous ionisation detector, and is widely used for the detection and measurement of many types of ionizing radiation, including X-rays, gamma rays, alpha particles and beta particles. Conventionally, the term "ionization chamber" refers exclusively to those detectors which collect all the charges created by direct ionization within the gas through the application of an electric field.
LausanneLausanne (loʊˈzæn , USalsoloʊˈzɑːn , lɔzan; Losena lɔˈzəna) is the capital and largest city of the Swiss French-speaking canton of Vaud. It is a hilly city situated on the shores of Lake Geneva, about halfway between the Jura Mountains and the Alps, and facing the French town of Évian-les-Bains across the lake. Lausanne is located northeast of Geneva, the nearest major city. The municipality of Lausanne has a population of about 140,000, making it the fourth largest city in Switzerland after Basel, Geneva, and Zurich, with the entire agglomeration area having about 420,000 inhabitants (as of January 2019).
Lausanne DistrictLausanne District (District de Lausanne) is a district in the canton of Vaud, Switzerland. The seat of the district is the city of Lausanne. Lausanne has an area, , of . Of this area, or 27.3% is used for agricultural purposes, while or 30.9% is forested. Of the rest of the land, or 41.6% is settled (buildings or roads) and or 0.1% is unproductive land. Lausanne has a population () of . Most of the population () speaks French (159,559 or 79.6%), with German being second most common (8,534 or 4.
Romanel-sur-LausanneRomanel-sur-Lausanne (ʁɔmanɛl syʁ lɔzan, literally Romanel on Lausanne; Romanél) is a municipality in the canton of Vaud in Switzerland, located in the district of Lausanne. Romanel-sur-Lausanne is first mentioned in 1184 as Romanes. Romanel-sur-Lausanne has an area, , of (depending on calculation method). Of this area, or 59.7% is used for agricultural purposes, while or 3.8% is forested. Of the rest of the land, or 37.8% is settled (buildings or roads). Of the built up area, industrial buildings made up 5.
