Mediaspace scheduled maintenance: Aug 25, 2026 07:00 - 12:00 AM. During this time, videos will be temporarily unavailable. Check status updates.

Lecture

Snow Processes at Snow-Atmosphere Interface

In course

ENV-525: Physics and hydrology of snow

This course covers principles of snow physics, snow hydrology, snow-atmosphere interaction, and snow modeling. It transmits detailed understanding of physical processes within the snow and at its interfaces with the atmosphere and the ground, and presents ...

Description

This lecture covers processes at the snow-atmosphere interface, including snow fall suspension, sublimation, rain, heat exchange, radiation, erosion, ventilation, and metamorphism. It also discusses extreme snow falls in the Swiss Alps and systematic topographical differences affecting snow depth.

This video is available exclusively on Mediaspace for a restricted audience. Please log in to MediaSpace to access it if you have the necessary permissions.

Watch on Mediaspace

Instructors (3)

Wolf Hendrik Huwald

Dr. Hendrik Huwald is a scientist at the Laboratory of Cryospheric Sciences (CRYOS) and a lecturer at the Environmental Sciences and Engineering Section (SSIE) of the Swiss Federal Institute of Technology in Lausanne (EPFL). He completed his PhD in 2003 at the Swiss Federal Institute of Technology in Zürich (ETHZ), developing a numerical model for sea ice and studying energy transfer processes in the Arctic. Between 2005 and 2012 he was a post-doctoral fellow and scientist at the Laboratory of Environmental Fluid Mechanics and Hydrology (EFLUM) of EPFL working on Alpine snow-atmosphere interaction, and energy balance-related research mainly in mountain regions. During this time, he designed, led and participated in numerous large field experiments in different environments. In 2013 he joined the newly founded CRYOS laboratory where he conducted research in the domains of snow science, hydrology, boundary layer meteorology and environmental sensing. He has extensive experience with project management both on national and international level.

Johan Alexandre Philippe Gaume

I started my scientific career in 2008 at the Grenoble University in the IRSTEA laboratory where I did my master's thesis on the rheology of dense granular materials using the discrete element method. In the same lab, I followed with a PhD on the numerical modeling of the release depth of extreme avalanches using a combined mechanical-statistical approach and spatial extreme statistics. In 2013 I obtained a postdoc position at the WSL Institute for Snow and Avalanche Research SLF in Davos where I was in charge of developing and applying numerical models to improve the evaluation of avalanche release conditions and thus avalanche forecasting. While my PhD was mostly theoretical and numerical, my postdoc in Davos allowed me to gain a practical expertise by participating in laboratory and field experiments which helped to validate the models I develop. In 2016, I was awarded a SNF grant to work as a research and teaching associate in CRYOS at EPFL on the multiscale modeling of snow and avalanche processes. I developed discrete approaches to model snow micro-structure deformation and failure in order to evaluate constitutive snow models to be used at a larger scale in continuum models. I also developed numerical models for wind-driven snow transport. In 2017, I was a Visiting Scholar at UCLA to work on a Material Point Method (MPM) to simulate both the initiation and propagation of snow avalanches in a unified manner. The UCLA MPM model was initially developed for the Disney movie "Frozen" and has been modified and enriched based on Critical State Soil Mechanics to model the release and flow of slab avalanches. The results of this collaboration have been published in Nature Communications. In 2018, I was awarded the SNF Eccellenza Professorial Fellowship and became professor at EPFL and head of SLAB, the Snow and Avalanche Simulation Laboratory. At SLAB, we study micro-mechanical failure and fracture propagation of porous brittle solids, with applications in snow slab avalanche release. We also simulate avalanche dynamics and flow regime transitions over complex 3D terrain through the development of new models (depth-resolved and depth-averaged) based on MPM.In 2020, I obtained a SPARK grant to develop a new approach to simulate and better understand complex process chains in gravitational mass movements, including permafrost instabilities, rock, snow and ice avalanches and transitions to debris flows.

Official source

Related concepts (32)

Vacuum deposition

Vacuum deposition , also known as vacuum coating or thin-film deposition, is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form optical coatings.

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Evaporation (deposition)

Evaporation is a common method of thin-film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel directly to the target object (substrate), where they condense back to a solid state. Evaporation is used in microfabrication, and to make macro-scale products such as metallized plastic film. Evaporation involves two basic processes: a hot source material evaporates and condenses on the substrate. It resembles the familiar process by which liquid water appears on the lid of a boiling pot.

Ionizing radiation

Ionizing radiation (or ionising radiation), including nuclear radiation, consists of subatomic particles or electromagnetic waves that have sufficient energy to ionize atoms or molecules by detaching electrons from them. Some particles can travel up to 99% of the speed of light, and the electromagnetic waves are on the high-energy portion of the electromagnetic spectrum. Gamma rays, X-rays, and the higher energy ultraviolet part of the electromagnetic spectrum are ionizing radiation, whereas the lower energy ultraviolet, visible light, nearly all types of laser light, infrared, microwaves, and radio waves are non-ionizing radiation.

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Related lectures (33)

Atoms and Radiation: Lineshapes

Explores atoms and radiation lineshapes, covering linewidths, lifetime broadening, and broadening mechanisms, including Lorentzian and Doppler effects.

PVD 7: Other Techniques MOOC: Micro and Nanofabrication (MEMS)

Explores ion plating, MBE, and PLD techniques in thin film fabrication.

Atoms and Radiation: Electromagnetic Wave Propagation

Explores electromagnetic wave propagation, including Poynting vector, irradiance, dipole radiation, dielectric constant, and natural linewidth in atoms and radiation.

Thin Films: Deposition and Growth

Explores thin film preparation, growth mechanisms, organic film considerations, and deposition techniques in electronics.

Film Growth: Growth Modes and Crystal Structure MOOC: Micro and Nanofabrication (MEMS)