Lecture

Intensity Vector: Different Waves

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In course

ME-413: Introduction to additive manufacturing

The state of the art in the domain of additive production processes (the part is built by material addition without use of a shape tool) will be presented. The main application/benefits/shortcomings of the common additive processes as well as technologi ...

Description

This lecture covers the intensity vector for different waves, focusing on the Poynting theory and its connection to the parameters characterizing plane electromagnetic waves. It explains the behavior of intensity vectors for plane and Gaussian electromagnetic waves, discussing their orientation, distribution, and power transport. The lecture also delves into the concept of caustic in Gaussian beams, describing its shape, asymptotic behavior, and relation to divergence and focal waist. Additionally, it explores the intensity of spherical electromagnetic waves, emphasizing their radial orientation and decay. Formulas and mathematical expressions are used to illustrate the concepts.

Instructors (3)

Eric Boillat

Contact Microcity Phone: 41 21 69 54456 Teaching & PhD Past EPFL PhD Students as codirector Serguei Kolossov, Cédric André, Jamasp Jhabvala, Christoph Van Gestel, Tatiana Polivnikova, Nikola Kalentics Courses Industrial production processes ME-212 Application windows of the main manufacturing process categories. Implementation of simple models describing the behavior of the main manufacturing processes. Basic understanding of the economic aspects of production processes. Manufacturing proc

Jürgen Brugger

I am a Professor of Microengineering and co-affiliated to Materials Science. Before joining EPFL I was at the MESA Research Institute of Nanotechnology at the University of Twente in the Netherlands, at the IBM Zurich Research Laboratory, and at the Hitachi Central Research Laboratory, in Tokyo, Japan. I received a Master in Physical-Electronics and a PhD degree from Neuchâtel University, Switzerland. Research in my laboratory focuses on various aspects of MEMS and Nanotechnology. My group contributes to the field at the fundamental level as well as in technological development, as demonstrated by the start-ups that spun off from the lab. In our research, key competences are in micro/nanofabrication, additive micro-manufacturing, new materials for MEMS, increasingly for wearable and biomedical applications. Together with my students and colleagues we published over 200 peer-refereed papers and I had the pleasure to supervise over 25 PhD students. Former students and postdocs have been successful in receiving awards and starting their own scientific careers. I am honoured for the appointment in 2016 as Fellow of the IEEE “For contributions to micro and nano manufacturing technology”. In 2017 my lab was awarded an ERC AdvG in the field of advanced micro-manufacturing.

Christophe Moser

Dr. Christophe Moser is Associate Professor of Microengineering and Industrial Relations at the Swiss Federal Institute of Technology in Lausanne. He was the co-founder and CEO of Ondax,Inc for ten years prior to joining EPFL. During this decade, he raised $15 million from corporate and venture capital sources to fund volume production of thick holographic components in glass and develop devices enabled by these components such as tunable add-drop multiplexers for telecommunications, ultra-narrowband notch filters for low frequency Raman systems, high power semi-conductor frequency-narrowed pumps for fiber lasers, single frequency fixed and tunable lasers for sensing and femtosecond pulse compressors for micro-machining applications. Dr. Moser has a Ph.D. in Electrical Engineering from the California Institute of Technology, a minor in finance and a bachelor degree in Physics from EPFL. He is the co-inventor of 24 patents, 14 peer reviewed scientific publications, 9 IEEE proceedings and a book chapter. Private interests include tennis, running, ski, basketball and family excursions. 2010: Associate Professor, EPFL, faculty Science Technique Ingenieur. 2000-2010: co-founder, CEO Ondax, Inc. 1995-2000: Graduate Research Assistant, California Institute of Technology. 1993-1995: Engineering Project manager , TESA. 1988-1993: Bachelor candidate in Physics, EPFL. MAIN PUBLICATIONS:

Moser C., Havermeyer F,.Ultra-narrowband tunable laserline notch filter, Appl. Phys. B, 95 (3), pp 597-601, 2009.

Moser C. ,Ho L., Havermeyer F,. Self-aligned Non-dispersive External Cavity Tunable Laser, 16 (21), 16691-16696 Optics Express, 2008.

Steckman, GJ , Moser C. et al. Volume holographic grating wavelength stabilized laser diodes, IEEE J. Of Selected Topics in Quantum Electronics, (13), 672-678, 2007.

Buse K, Havermeyer F, Liu W., Moser C, Psaltis D. Holographic Filters , Book Chapter Photorefractive Materials and their Applications, 2005.

Havermeyer, F; Liu, WH; Moser, C, et al. Volume holographic grating-based continuously tunable optical filter , Opt. Eng. 43 (9), 2017-2021, 2004.

Moser C., Maravic I., Schupp B., Adibi A, Psaltis D, Diffraction efficiency of localized holograms in doubly doped LiNbO3 crystals, Opt. Lett. 25: (17),1243-1245, 2000.

Official source

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