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Course

MICRO-632: Advanced micro-/nano- manufacturing

Summary

This course contains lectures covering the latest research and development done in the field of micro-/nano- manufacturing methods and processes.

It consists on an intensive 5 days training and is done in the framework of a collaboration between FEMTO-ST in France and EPFL.

Lectures

Instructors (2)

Olivier Martin

Olivier J.F. Martin received the M.Sc. and Ph.D. degrees in physics in 1989 and 1994, respectively, from the Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland. In 1989, he joined IBM Zurich Research Laboratory, where he investigated thermal and optical properties of semiconductor laser diodes. Between 1994 and 1997 he was a research staff member at the Swiss Federal Institute of Technology, Zurich (ETHZ). In 1997 he received a Lecturer fellowship from the Swiss National Science Foundation (SNSF). During the period 1996-1999, he spent a year and a half in the U.S.A., as invited scientist at the University of California in San Diego (UCSD). In 2001 he received a Professorship grant from the SNSF and became Professor of Nano-Optics at the ETHZ. In 2003, he was appointed Professor of Nanophotonics and Optical Signal Processing at the Swiss Federal Institute of Technology, Lausanne (EPFL), where he is currently head of the Nanophotonics and Metrology Laboratory and Director of the Microengineering Section.

Christophe Moser

Dr. Christophe Moser is Associate Professor of Microengineering and Industrial Relations at the Swiss Federal Institute of Technology in Lausanne. He was the co-founder and CEO of Ondax,Inc for ten years prior to joining EPFL. During this decade, he raised $15 million from corporate and venture capital sources to fund volume production of thick holographic components in glass and develop devices enabled by these components such as tunable add-drop multiplexers for telecommunications, ultra-narrowband notch filters for low frequency Raman systems, high power semi-conductor frequency-narrowed pumps for fiber lasers, single frequency fixed and tunable lasers for sensing and femtosecond pulse compressors for micro-machining applications. Dr. Moser has a Ph.D. in Electrical Engineering from the California Institute of Technology, a minor in finance and a bachelor degree in Physics from EPFL. He is the co-inventor of 24 patents, 14 peer reviewed scientific publications, 9 IEEE proceedings and a book chapter. Private interests include tennis, running, ski, basketball and family excursions. 2010: Associate Professor, EPFL, faculty Science Technique Ingenieur. 2000-2010: co-founder, CEO Ondax, Inc. 1995-2000: Graduate Research Assistant, California Institute of Technology. 1993-1995: Engineering Project manager , TESA. 1988-1993: Bachelor candidate in Physics, EPFL. MAIN PUBLICATIONS:

Moser C., Havermeyer F,.Ultra-narrowband tunable laserline notch filter, Appl. Phys. B, 95 (3), pp 597-601, 2009.

Moser C. ,Ho L., Havermeyer F,. Self-aligned Non-dispersive External Cavity Tunable Laser, 16 (21), 16691-16696 Optics Express, 2008.

Steckman, GJ , Moser C. et al. Volume holographic grating wavelength stabilized laser diodes, IEEE J. Of Selected Topics in Quantum Electronics, (13), 672-678, 2007.

Buse K, Havermeyer F, Liu W., Moser C, Psaltis D. Holographic Filters , Book Chapter Photorefractive Materials and their Applications, 2005.

Havermeyer, F; Liu, WH; Moser, C, et al. Volume holographic grating-based continuously tunable optical filter , Opt. Eng. 43 (9), 2017-2021, 2004.

Moser C., Maravic I., Schupp B., Adibi A, Psaltis D, Diffraction efficiency of localized holograms in doubly doped LiNbO3 crystals, Opt. Lett. 25: (17),1243-1245, 2000.

Official source

Moodle Page

http://go.epfl.ch/MICRO-632

Summary

This course contains lectures covering the latest research and development done in the field of micro-/nano- manufacturing methods and processes.

It consists on an intensive 5 days training and is done in the framework of a collaboration between FEMTO-ST in France and EPFL.

Lectures

Instructors (2)

Olivier Martin

Christophe Moser

Moser C., Havermeyer F,.Ultra-narrowband tunable laserline notch filter, Appl. Phys. B, 95 (3), pp 597-601, 2009.

Moser C. ,Ho L., Havermeyer F,. Self-aligned Non-dispersive External Cavity Tunable Laser, 16 (21), 16691-16696 Optics Express, 2008.

Steckman, GJ , Moser C. et al. Volume holographic grating wavelength stabilized laser diodes, IEEE J. Of Selected Topics in Quantum Electronics, (13), 672-678, 2007.

Buse K, Havermeyer F, Liu W., Moser C, Psaltis D. Holographic Filters , Book Chapter Photorefractive Materials and their Applications, 2005.

Havermeyer, F; Liu, WH; Moser, C, et al. Volume holographic grating-based continuously tunable optical filter , Opt. Eng. 43 (9), 2017-2021, 2004.

Moser C., Maravic I., Schupp B., Adibi A, Psaltis D, Diffraction efficiency of localized holograms in doubly doped LiNbO3 crystals, Opt. Lett. 25: (17),1243-1245, 2000.

Official source

Moodle Page

http://go.epfl.ch/MICRO-632

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