Stephan BrunnerTeaching & PhD PhD Students Hugo Jean Elie Chkroun, Nicole Vadot, Oraz Anuaruly, Haomin Sun, Isabel Muzio, Fabien Nicolas Jeanquartier Past EPFL PhD Students Ajay Chandrarajan Jayalekshmi, Arnas Volcokas Past EPFL PhD Students as codirector Xavier Lapillonne, Thibaut Vernay, Julien Stanislas Pierre Dominski, Gabriele Merlo, Emmanuel Lanti, Noé Ohana, Moahan Murugappan Courses Plasma instabilities PHYS-736 To complete the theoretical knowledge acquired before the graduate studies.
Christine StollbergTeaching & PhD PhD Students Amélie Renggli, Vanni Jonas Meier Courses Atomic and radiative processes in plasmas PHYS-762 The course covers atomic structure, collisional-radiative (CR) processes, and spectroscopic techniques. Students learn to critically apply CR models, evaluate spectroscopic tools, and interpret experimental data obtained in different plasmas.
Simon Pierre Henri VincentTeaching & PhD Courses General physics : electromagnetism PHYS-201(a) The topics covered by the course are concepts of electromagnetism and electromagnetic waves.
Marcelo Baquero RuizTeaching & PhD PhD Students Michael Goddijn, Cyrille Sepulchre Past EPFL PhD Students as codirector Kadi Lyes Roland Courses Fusion and industrial plasma technologies PHYS-632 The course provides an overview of the technologies that are essential for fusion developments and for industrial plasmaapplications, highlighting the synergies between the two fields. The aim is to provide a combined theoretical andexperimental background to the various topics. General physics : mechanics (English
Alan HowlingTeaching & PhD Past EPFL PhD Students Juliette Ballutaud Past EPFL PhD Students as codirector Boris Legradic, Michaël Chesaux, Ralph Schnyder, Riccardo Agnello
Philippe FlückigerSince 1999 Philippe Flückiger is the Director of Operations at the EPFL Center of MicroNanoTechnology, a world-class state-of-the-art cleanroom dedicated to research and development in the field of Micro and NanoFabrication. He received his diploma in physics from the University of Neuchâtel, Switzerland in 1987 and his PhD from the same University in 1993. His thesis work was dedicated to the deposition, patterning and characterization of high temperature superconductor epitaxial thin films. From 1993 to 1994 he was a post doc at Stanford University to develop submicron lithography with the atomic force microscope in the group of Calvin Quate, inventor of the AFM. From 1995 to 1997 he was successively process engineer, project manager and process engineering manager at Micronas SA in Bevaix, Switzerland, a microelectronics company producing baseband processors and voltage regulators for wireless applications, mostly ASICs for Nokia Mobile Phones. In 1997 he spent 4 months in the production line of EM Microelectronic Marin SA, Switzerland, a semiconductor manufacturer specialized in the design and production of ultra low power, low voltage integrated circuits for battery-operated and field-powered applications. He joined then the Swiss Federal Institute of Technology in Lausanne (EPFL) to start the new activity in diffusion, oxidation and CVD at the Center of MicroNanoTechnology. He was appointed Director of Operations of the Center in 1999.
Mihai Adrian IonescuAdrian M. Ionescu is Full Professor at the Swiss Federal Institute of Technology, Lausanne, Switzerland. He received the B.S./M.S. and Ph.D. degrees from the Polytechnic Institute of Bucharest, Romania and the National Polytechnic Institute of Grenoble, France, in 1989 and 1997, respectively. He has held staff and/or visiting positions at LETI-CEA, Grenoble, France and INP Grenoble, France and Stanford University, USA, in 1998 and 1999. Dr. Ionescu has published more than 600 articles in international journals and conferences. He received many Best Paper Awards in international conferences, the Annual Award of the Technical Section of the Romanian Academy of Sciences in 1994 and the Blondel Medal in 2009 for contributions to the progress in engineering sciences in the domain of electronics. He is the 2013 recipient of the IBM Faculty Award in Engineering. He served the IEDM and VLSI conference technical committees and was the Technical Program Committee (Co)Chair of ESSDERC in 2006 and 2013. He is a member of the SATW. He is director of the Laboratory of Micro/Nanoelectronic Devices (NANOLAB).
Cyrille HibertCyrille HIBERT received his diploma in Physics in 1994 and his PhD in 1998 from University of Orleans (FR). He then held a post doctoral position in GREMI laboratory at the University of Orleans in collaboration with Alcatel Vacuum Technology and ST Microelectronics, working in deep anisotropic etching of silicon with an Inductively Coupled Plasma reactor. In May 2000 he joined the EPFL-Center of Micro-Nano-technology where he was in charge of the plasma etching activities. He left EPFL in October 2003 for a sabbatical year to join the CFF group at NMRC (Ireland) now called Tyndall Institute. He worked on developing plasma processing. In October 2004, he came back to EPFL-CMI to be in charge of etching and nanotechnology activities (FIB and future ebeam litho).
